Across International Liquid Vaporization System

The LEP-800 Liquid Evaporator is engineered for precise delivery of liquid precursors into Chemical Vapor Deposition (CVD) systems, commonly used in laboratory environments. Liquid flow is meticulously controlled by a peristaltic pump, which introduces the liquid into the mixing system. The liquid is then uniformly heated by an integrated heater, ensuring efficient vaporization. The generated vapor is transported into the furnace tube via carrier gases such as hydrogen, nitrogen, or argon supplied by the gas distribution system.

The LEP-800 is capable of vaporizing a wide range of liquids, including H₂O, CH₃OH, TiCl₄, SiHCl₃, and Zn(C₂H₅)₂, in addition to various liquid mixtures. This system is highly suitable for CVD processes, catalytic reactions, and activation experiments requiring non-corrosive liquid vapor sources.

Applications:

The LEP-800 system can seamlessly integrate with all of our tube furnaces and CVD setups. To ensure the vaporized liquid remains in the gas phase during transfer, an external heating belt can be applied to the connecting pipelines, preventing any condensation or re-liquefaction of the vapor.